• Users Online: 287
  • Print this page
  • Email this page
Year : 2021  |  Volume : 29  |  Issue : 3  |  Page : 186-189

Single flap use for synchronous reconstruction of full-thickness upper and lower lip defects due to high-voltage electrical burn

Department of Plastic Reconstructive and Aesthetic Surgery, Kocaeli University, Izmit, Kocaeli, Turkey

Correspondence Address:
Dr. Emrah Kagan Yasar
Department of Plastic, Reconstructive and Aesthetic Surgery, School of Medicine, Kocaeli University, Kocaeli
Login to access the Email id

Source of Support: None, Conflict of Interest: None

DOI: 10.4103/tjps.tjps_98_20

Get Permissions

High-voltage electric burns are a major source of morbidity and mortality, with significant socioeconomic and psychosocial implications. Electric burns rarely cause injury to atypical areas including the oral region with a reported incidence of 2.2%–3.5%. The ratio of burn area to total lip is critical for reconstruction options. Locally usable flap choices will be insufficient for subtotal defects of lips. Electrical burn of both lips is a rarely seen entity that is surgically challenging for both lip reconstruction with the minimum morbidity. It is known that a radial forearm free flap (RFFF) is suitable for total lip reconstruction and in addition, is one of the best options for simultaneous upper and lower lip reconstruction using only one RFFF. In this study, a case with both lower and upper lib necrosis, a rarely affected area due to high-voltage electrical burn, is presented. Reconstruction with a free radial forearm flap was successfully performed although the patient was presented in the subacute period as timing.

Print this article     Email this article
 Next article
 Previous article
 Table of Contents

 Similar in PUBMED
   Search Pubmed for
   Search in Google Scholar for
 Related articles
 Citation Manager
 Access Statistics
 Reader Comments
 Email Alert *
 Add to My List *
 * Requires registration (Free)

 Article Access Statistics
    PDF Downloaded45    
    Comments [Add]    

Recommend this journal